Oway After-Sun Hair Mask is a rich, reparative treatment for hair stressed by sun, wind and salt. It deeply nourishes the lengths, helping restore softness, elasticity and manageability while reducing feelings of dryness and stiffness without weighing the hair down.
• Nourishes deep down and restores the lipid balance of the hair fibre
• Repairs and seals the cuticles
• Gives shine to the hair fibre.
Aqua/Water/Eau OZ, Cetearyl Alcohol ND, Myristyl Alcohol ND, Cetrimonium Chloride ND, Calendula Officinalis Flower Extract BD, Adansonia Digitata Seed Oil O, Passiflora Edulis Seed Oil FT, Polymnia Sonchifolia Root Juice ND, Helianthus Annuus (Sunflower) Seed Oil ND, Citrus Aurantium Bergamia (Bergamot) Fruit Oil EO, Citrus Limon (Lemon) Peel Oil EO/BD, Foeniculum Vulgare (Fennel) Oil EO/BD, Citrus Aurantium Dulcis (Orange) Peel Oil EO, C13-15 Alkane ND, Behentrimonium Chloride ND, Bis-(Isostearoyl/Oleoyl Isopropyl) Dimonium Methosulfate ND, Myristyl Lactate ND, Dicaprylyl Ether ND, Lauryl Alcohol ND, Tocopheryl Acetate, Tocopherol ND, Xanthan Gum ND, Isopropyl Alcohol, Glyceryl Laurate ND, Citric Acid ND, Benzyl Alcohol, Sodium Benzoate, Potassium Sorbate, Limonene ND, Linalool ND
Apply to clean, wet hair and leave on for 3-5 minutes. Rinse thoroughly.